TMEIC will participate in the SEMICON Japan 2008
TMEIC will be showing "N2 Less Type Ultra-high Concentration Ozone Generator" for advanced process such as ALD. "Heat Pipe Technology" for thermal control of wafer surface and equipment. Our "Only-One Technology" will support next generation semiconductor manufacturing process. December 3-5, at Makuhari Messe, Chiba, Japan. (TMEIC Booth:3D-701)
